Scanning localized arc discharge lithography for the fabrication of microstructures made of carbon nanotubes

Nanotechnology

Volumn 18, Issue 38, 2007, Pages

  Zhu, Y W ^a   Sow, C H ^a   Sim, M C ^a   Sharma, G ^b   Kripesh, V ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; LITHOGRAPHY; MICROFABRICATION; MICROSCOPIC EXAMINATION; MICROSTRUCTURE; MORPHOLOGY;

ALIGNED ARRAYS; CONDUCTIVE TIPS; TRUNCATION;

MULTIWALLED CARBON NANOTUBES (MWCN);

CARBON NANOTUBE; MULTI WALLED NANOTUBE;

ARTICLE; CRYSTAL STRUCTURE; ELECTRIC CURRENT; MICROSCOPY; MORPHOLOGY; NANODEVICE; NANOFABRICATION; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY;

EID: 34848829469     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/38/385304     Document Type: Article

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