Characteristic of organic thin film depending on carbon content by fourier transform infrared spectra and X-ray diffraction pattern

Bulletin of the Korean Chemical Society

Volumn 28, Issue 9, 2007, Pages 1588-1590

  Oh, Teresa ^a  

^a Chongju University   (South Korea)

Author keywords

FTIR spectra; Si CH3 bond; Si O C bond; X ray diffraction pattern

Indexed keywords

EID: 34848821926     PISSN: 02532964     EISSN: 12295949     Source Type: Journal    
DOI: 10.5012/bkcs.2007.28.9.1588     Document Type: Article

References (12)

1. Hideki, N.; Tokiyoshi, U.; Hiroyoshi, M.; Akihiko, F.; Masarori, O. Jpn. J. Appl. Phys. 2006, 45, 2792.
2. Hiroyuki, I. Jpn. J. Appl. Phys. 2006, 45, 1540.
3. Masahito, K.; Yoshiaki, I.; Kieko, H.; Kazuyuki, S. Thin Solid Films 2006, 509, 149.
4. Teresa, O. Jpn. J. Appl. Phys. 2005, 44, 4103.
5. Knipp, D.; Street, R. A. J. Non-crystalline Solids 2004, 338, 595.
6. Nathalie, V.; Mario, S.; Wim, D. Tetrahedron Lett. 2004, 45, 7287.
7. Kymissis, I.; Dimitrakopoulos, D. C.; Purushothaman, S. IEEE Transactions on Electron Devices 2001, 48, 1060.
8. Jae, H. Y.; Min, K. K.; Ji, H. S.; Hyun, J. C.; Young, U. K. Bull. Korean Chem. Soc. 2007, 28, 1097.
9. Chang, M. K. Bull. Korean Chem. Soc. 2006, 27, 2037.
10. Gerald, D. Surface Science 2006, 600, 971.
11. Teresa, O. IEEE transactions on Nanotechnology 2006, 5, 23.
12. Teresa, O. Jpn. J. Appl. Phys. 2005, 44, 8102.