Expansion transport regime in pulsed-pressure chemical vapor deposition

Chemical Engineering Science

Volumn 62, Issue 22, 2007, Pages 6121-6128

  Krumdieck, S P ^a   Cave, H M ^a   Baluti, S ^a   Jermy, M ^a   Peled, A ^b  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

^b RAFAEL   (Israel)

Author keywords

CVD; Fluid mechanics; Gas expansion; Mass transfer; Parameter identification; Transport processes

Indexed keywords

DYNAMIC ANALYSIS; FLOW OF GASES; FLUID MECHANICS; MASS TRANSFER; NAPHTHALENE; PARAMETER ESTIMATION; PROCESS CONTROL; SUBLIMATION;

GAS EXPANSION; REGIME TRANSITION; TRANSPORT PROCESSES;

CHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION; DYNAMIC ANALYSIS; FLOW OF GASES; FLUID MECHANICS; MASS TRANSFER; NAPHTHALENE; PARAMETER ESTIMATION; PROCESS CONTROL; SUBLIMATION;

EID: 34848820002     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ces.2007.07.003     Document Type: Article

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