Sidewall roughness measurement inside photonic crystal holes by atomic force microscopy

Nanotechnology

Volumn 18, Issue 40, 2007, Pages

  Strasser, P ^a   Robin, F ^a   Carlstrom C F ^b   Wuest R ^a   Kappeler, R ^a   Jackel H ^a  

^a ETH ZURICH   (Switzerland)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; PLASMA ETCHING; SCANNING; SEMICONDUCTOR PLASMAS; SURFACE ROUGHNESS;

PHOTONIC CRYSTAL HOLES; PLANAR PHOTONIC CRYSTALS; SEMICONDUCTOR ETCHING PLASMAS; SIDEWALL ROUGHNESS;

PHOTONIC CRYSTALS;

NITROGEN;

ARTICLE; ATOMIC FORCE MICROSCOPY; CRYSTAL; ELECTRON BEAM; MEASUREMENT; PHOTONIC CRYSTAL; PLASMA; PRIORITY JOURNAL; SEMICONDUCTOR; SURFACE PROPERTY;

EID: 34748845654     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/40/405703     Document Type: Article

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