Formation of metal nanoparticles in silica by the sequential implantation of Ag and Cu

Applied Physics A: Materials Science and Processing

Volumn 89, Issue 3, 2007, Pages 681-684

  Xiao, X H ^a   Guo, L P ^a   Ren, F ^a   Wang, J B ^a   Fu, D J ^a   Chen, D L ^b   Wu, Z Y ^b   Jia, Q J ^b   Liu, C ^a   Jiang, C Z ^a  

^a WUHAN UNIVERSITY   (China)

^b INSTITUTE OF HIGH ENERGY PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; ION IMPLANTATION; SILICA; SILVER; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY; X RAY DIFFRACTION;

ION DOSES; SEQUENTIAL IMPLANTATION;

NANOPARTICLES;

EID: 34748819378     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-007-4146-y     Document Type: Article

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