Nanocluster formation in silicate glasses by sequential ion implantation procedures

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 148, Issue 1-4, 1999, Pages 1007-1011

  Cattaruzza, E ^a   Battaglin, G ^a   Polloni, R ^a   Cesca, T ^b   Gonella, F ^b   Mattei, G ^b   Maurizio, C ^b   Mazzoldi, P ^b   D'Acapito, F ^c   Zontone, F ^c   Bertoncello, R ^b  

^a INFM   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

^c EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

Glass composites; Ion implantation; Nanoclusters

Indexed keywords

ABSORPTION SPECTROSCOPY; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; OPTICAL MICROSCOPY; SEMICONDUCTING GLASS; SYNCHROTRON RADIATION; TRANSMISSION ELECTRON MICROSCOPY;

NANOCLUSTER FORMATION;

FUSED SILICA;

EID: 0033513847     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00665-X     Document Type: Article

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