Silver negative-ion implantation into thermally grown thin SiO2 film on Si substrate and heat treatment for formation of silver nanoparticles

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 B, 2007, Pages 6260-6266

  Arai, Nobutoshi ^a,b   Tsuji, Hiroshi ^a   Adachi, Kouichirou ^b   Kotaki, Hiroshi ^b   Gotoh, Yasuhito ^a   Ishikawa, Junzo ^a  

^a KYOTO UNIVERSITY   (Japan)

^b SHARP CORPORATION   (Japan)

Author keywords

High resolution Rutherford backscattering spectrometry; Negative ion implantation; Silver nanoparticle; Surface plasmon resonance; Thermal diffusion

Indexed keywords

DIFFUSION BARRIERS; FILM GROWTH; HEAT TREATMENT; ION IMPLANTATION; NANOPARTICLES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SILVER; SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY;

HIGH-RESOLUTION RUTHERFORD BACKSCATTERING SPECTROMETRY; NEGATIVE ION IMPLANTATION; SILVER NANOPARTICLES;

THIN FILMS;

EID: 34648829974     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6260     Document Type: Article

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