Low temperature metal induced crystallization of amorphous silicon by nano-gold-particles

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 42-45, 2006, Pages

  Yang, Ru Yuan ^a   Weng, Min Hang ^b   Liang, Chihng Tsung ^c   Su, Yan Kuin ^a   Shy, Shyi Long ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^c KUN SHAN UNIVERSITY   (Taiwan)

Author keywords

Metal induced crystallization; Nano gold particles; Suicide; TFT

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION KINETICS; GOLD; LOW TEMPERATURE EFFECTS; RAPID THERMAL ANNEALING; THIN FILM TRANSISTORS; X RAY DIFFRACTION;

CRYSTALLIZATION TEMPERATURE; METAL INDUCED CRYSTALLIZATION; NANO GOLD-PARTICLES;

NANOPARTICLES;

EID: 34548785011     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L1146     Document Type: Article

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