A new process for fabricating nanodot arrays on selective regions with diblock copolymer thin film

Nanotechnology

Volumn 18, Issue 36, 2007, Pages

  Park, Dae Ho ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

NANODOMAINS; NANODOT ARRAYS; SODIUM BICARBONATE; SOLVENT ANNEALING;

BLOCK COPOLYMERS; CARBOXYLIC ACIDS; POLYSTYRENES; SOLUTIONS; ULTRAVIOLET RADIATION; ZINC OXIDE;

THIN FILMS;

BICARBONATE; CARBOXYLIC ACID; COPOLYMER; DIOXANE; HYDROCHLORIC ACID; NANOMATERIAL; POLYACRYLIC ACID; POLYSTYRENE BETA POLY(TERT BUTYL ACRYLATE); QUANTUM DOT; UNCLASSIFIED DRUG; ZINC ACETATE;

ARTICLE; FILM; NANOANALYSIS; NANOTECHNOLOGY; PRIORITY JOURNAL; ULTRAVIOLET RADIATION;

EID: 34548702472     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/36/365303     Document Type: Article

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