Mechanical stress gradients in thin films analyzed employing X- Ray diffraction measurements at constant penetration/information depths

Materials Science Forum

Volumn 524-525, Issue , 2006, Pages 19-24

  Wohlschlogel M ^a   Baumann, W ^a   Welzel, U ^a   Mittemeijer, E J ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Information depth; Penetration depth; Stress gradients; X ray diffraction residual stress analysis

Indexed keywords

CONCENTRATION (PROCESS); GAMMA RAYS; MEASUREMENT THEORY; NITROGEN; SILICON WAFERS; STRESS ANALYSIS; X RAY DIFFRACTION ANALYSIS;

INFORMATION DEPTH; PENETRATION DEPTH; STRESS GRADIENTS; X-RAY DIFFRACTION RESIDUAL STRESS ANALYSIS;

THIN FILMS;

EID: 34548682273     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-414-6.19     Document Type: Conference Paper

References (9)

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