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Volumn 42, Issue 6 A, 2003, Pages 3578-3581

Low-temperature growth of carbon nanotube by plasma-enhanced chemical vapor deposition using nickel catalyst

Author keywords

CNTs; Native oxide; Nickel catalyst; PECVD; Purification

Indexed keywords

CRYSTAL GROWTH; CRYSTAL MICROSTRUCTURE; DIFFUSION IN SOLIDS; IMPURITIES; LOW TEMPERATURE EFFECTS; NICKEL; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PURIFICATION; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL);

EID: 0041880449     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3578     Document Type: Article
Times cited : (21)

References (12)
  • 1
    • 0342819025 scopus 로고
    • S. Iijima: Nature 354 (1991) 56.
    • (1991) Nature , vol.354 , pp. 56
    • Iijima, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.