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Volumn 18, Issue 39, 2007, Pages

Low-plasma and high-temperature PECVD grown silicon-rich SiOx film with enhanced carrier tunneling and light emission

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ELECTROLUMINESCENCE; ELECTRON TUNNELING; ENERGY DISSIPATION; LIGHT EMISSION; NANOCRYSTALS; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; STOICHIOMETRY; THIN FILMS;

EID: 34548538171     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/39/395202     Document Type: Article
Times cited : (26)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.