Topographic control on silicone surface using chemical oxidization method

Applied Surface Science

Volumn 253, Issue 24, 2007, Pages 9381-9386

  Shih, Teng Kai ^a   Ho, Jeng Rong ^b   Chen, Chia Fu ^a,c   Whang, Wha Tzong ^a   Chen, Chien Chung ^d  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL CHUNG CHENG UNIVERSITY   (Taiwan)

^c MINGDAO UNIVERSITY   (Taiwan)

^d INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Chemical modification; PDMS; Wrinkles

Indexed keywords

CHEMICAL MODIFICATION; COMPRESSIVE STRESS; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROOPTICS; PRESSURE SENSORS; SPECTROMETRY; SURFACE TOPOGRAPHY; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL OXIDIZATION; FOURIER TRANSFORM INFRARED SPECTROMETRY; TOPOGRAPHIC CONTROL;

SILICONES;

EID: 34548505828     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.05.073     Document Type: Article

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