Chromium in amorphous hydrogenated carbon based thin films prepared in a PACVD process

Carbon

Volumn 37, Issue 5, 1999, Pages 843-846

  Gantenbein, P ^a   Brunold, S ^a   Frei, U ^a   Geng, J ^b   Schuler A ^b   Oelhafen, P ^b  

^a School of Engineering   (Switzerland)

^b UNIVERSITY OF BASEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBIDES; CERMETS; CHROMIUM; CHROMIUM COMPOUNDS; DIFFUSION IN SOLIDS; ELECTRONIC DENSITY OF STATES; ELECTRONIC STRUCTURE; FERMI LEVEL; FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

AMORPHOUS HYDROGENATED CARBON FILMS; CHROMIUM CARBIDE;

CARBON;

EID: 0032640210     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0008-6223(98)00282-6     Document Type: Article

References (6)

1. Gampp R., Oelhafen P., Gantenbein P., Brunold S., Frei U., Accelerated ageing tests of chromium containing amorphous hydrogenated carbon coatings for solar collectors. In: International Symposium on Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XV, Freiburg, Germany, Sept. 1996.
2. Keudell A. Growth Mechanisms during the plasma enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry, IPP 9/110, Max Planck-Institut für Plasmaphysik, Garching, 1996.
3. Behrisch R., editor, Andersen H.H., contributor. Sputtering by particle bombardment/sputtering Yield measurements In: Springer-Topics in Applied Physics, 1981-1991.
4. Ugolini D., Oelhafen P., Wittmer M., In: Koidl and Oelhafen P., editors, Amorphous hydrogenated carbon films. Les Ulis (France): Les Editions de Physique, 1987:297.
5. Schäfer J., Ristein J., Ley L., Electronic density of states and deep defects of hydrogenated amorphous carbon (a-C:H). In: Diamond Films, Portugal 1993.
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