The effects of pulsed substrate biasing on thin amorphous carbon coatings: A statistical design of experiment study

Journal of Physics D: Applied Physics

Volumn 40, Issue 18, 2007, Pages 5438-5445

  Wilson, G M ^a   Sullivan, J L ^a  

^a ASTON UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; ATOMIC FORCE MICROSCOPY; ELECTRIC POTENTIAL; OPTIMIZATION; PULSE TIME MODULATION; STATISTICAL METHODS; SURFACE TOPOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

BIAS PARAMETERS; PEAK VOLTAGE; PULSE BIAS;

COATING TECHNIQUES;

EID: 34548422416     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/18/S04     Document Type: Article

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