Feature size dependence on hysteresis due to relative humidity ramping and patterning order in dip-pen nanolithography

Journal of Experimental Nanoscience

Volumn 2, Issue 3, 2007, Pages 229-237

  Nafday, O A ^a   Weeks, B L ^a  

^a Department of Electrical and Computer Engineering   (United States)

Author keywords

Atomic force microscope; Dip pen nanolithography; Mercaptohexadecanoic acid; Relative humidity; Water meniscus

Indexed keywords

GOLD; MERCAPTOHEXADECANOIC ACID; PALMITIC ACID DERIVATIVE; UNCLASSIFIED DRUG;

ANALYTIC METHOD; ANALYTICAL ERROR; ARTICLE; ATOMIC FORCE MICROSCOPY; CALCULATION; CONTROLLED STUDY; DIP PEN NANOLITHOGRAPHY; HUMIDITY; HYDROPHILICITY; HYSTERESIS; LINEAR SYSTEM; PRIORITY JOURNAL; QUANTITATIVE ANALYSIS; REPRODUCIBILITY; SEMICONDUCTOR; TIME;

EID: 34548356935     PISSN: 17458080     EISSN: 17458099     Source Type: Journal    
DOI: 10.1080/17458080701268909     Document Type: Article

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