Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching

Microsystem Technologies

Volumn 13, Issue 8-10, 2007, Pages 1411-1416

  Kanamori, Yoshiaki ^a   Sato, Junya ^a   Shimano, Takeshi ^b   Nakamura, Shigeo ^b   Hane, Kazuhiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; LITHOGRAPHY; MICROSTRUCTURE; REACTIVE ION ETCHING; SILICON; SILICON WAFERS; SUBSTRATES; THREE DIMENSIONAL;

ETCHING RATIO; POLYMER STRUCTURES; STEREO-LITHOGRAPHY;

LASER APPLICATIONS;

EID: 34548293660     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0380-7     Document Type: Conference Paper

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