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Volumn 57, Issue 10, 2007, Pages 968-971

Compositionally bilayered feature of interfacial voids in a porous anodic alumina template directly formed on Si

Author keywords

Barrier layer; Porous anodic alumina; Si; Void

Indexed keywords

ALUMINA; INTERFACES (MATERIALS); METALLIC FILMS; SUBSTRATES;

EID: 34548187546     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2007.06.067     Document Type: Article
Times cited : (15)

References (14)
  • 10
    • 0343761837 scopus 로고
    • Silicon Processing for the VLSI Era
    • Lattice Press, Sunset Beach, California p. 20
    • Wolf S. Silicon Processing for the VLSI Era. Process Integration vol. 2 (1990), Lattice Press, Sunset Beach, California p. 20
    • (1990) Process Integration , vol.2
    • Wolf, S.1
  • 11
    • 34548154345 scopus 로고    scopus 로고
    • note
    • The specimen must have a flat, highly polished surface placed at known angle (15° in this work) to the incident beam and the X-ray spectrometer. In our case, however, the concave profile of voids and pores causes to topologically scatter the generated X-rays, so the intensity of X-rays monitored in Figure 3 normally decreases on the locations of pore and void. Given this geometric effect, further higher counts of the Al peaks should be monitored from the void edges.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.