Remote plasma deposited silicon sioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology

Plasma Processes and Polymers

Volumn 4, Issue 6, 2007, Pages 621-628

  Milella, Antonella ^a   Creatore, Mariadriana ^a   Blauw, Michiel A ^a   van de Sanden, Marius C M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Expanding thermal plasmas; Ion bombardment; Silicon dioxide like films

Indexed keywords

CONDENSATION; DENSIFICATION; FILM GROWTH; ION BOMBARDMENT; MORPHOLOGY; SILICA; SURFACE ROUGHNESS;

EXPANDING THERMAL PLASMA; SILANOL GROUP; SUBSTRATE BIAS;

PLASMA DEPOSITION;

EID: 34548133644     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200700007     Document Type: Article

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