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Volumn 15, Issue 7, 2007, Pages 1084-1089

Theory and experiment on hydrodynamic suspension ultra-smooth machining for silicon wafers

Author keywords

Hydrodynamic suspension; Removal mechanism; Silicon wafer; Ultra smooth machining

Indexed keywords

HYDRODYNAMICS; MACHINING; PLASTIC DEFORMATION; SURFACE ROUGHNESS;

EID: 34547979132     PISSN: 1004924X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (11)

References (14)
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  • 2
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  • 4
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    • Surface roughness of optical elements fabricated by magnetic fluid-assisted polishing
    • in Chinese
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  • 5
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    • Deformation and material removal rate in polishing silicon wafers
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  • 6
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    • Analysis of material removal mechanism in fluid jet polishing by finite element method
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  • 7
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    • Atomistic simulations of structural transformations of silicon surfaces under nanoindentation
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  • 8
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    • 3 particle on silicon wafer surface
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.