Experimental and theoretical study on laser cleaning Al2O3 particle on silicon wafer surface

Guangxue Jingmi Gongcheng/Optics and Precision Engineering

Volumn 14, Issue 5, 2006, Pages 764-770

  Wu, Dong Jiang ^a   Xu, Yuan ^a   Wang, Xu Yue ^a   Kang, Ren Ke ^a   Sima, Yuan ^a   Hu, Li Zhong ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Al2O3 particle; Cleaning efficiency; Laser cleaning; Silicon wafer

Indexed keywords

DRY CLEANING; EXCIMER LASERS; FINITE ELEMENT METHOD; HEAT CONDUCTION; LASER APPLICATIONS; LASER BEAMS; POLISHING; SURFACE CLEANING;

ADHESION FORCE; ALUMINA PARTICLE; CLEANING EFFICIENCY; LASER CLEANING;

SILICON WAFERS;

EID: 33845538781     PISSN: 1004924X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (18)

1. LI Y H, LI Q X, WANG D SH, et al. Design and study on a novel micro-detecting device for superfinish surface scratch[J]. Optics and Precision Engineering, 2005, 13: 65-68. (in Chinese)
2. HAN R J, SUN H D, XU D Q. Cryogenic polishing technology of monocrystal line silicon wafer[J]. Optics and Precision Engineering 1998, (6)5: 104-109. (in Chinese)
3. ALLEN S D, MILLER A S, LEE S J. Laser assisted particle removal dry-cleaning of critical surfaces[J]. Materials Science and Engineering, 1997, 49: 85-88.
4. BLOISI F, BARONE A C, VICARI L. Dry laser cleaning of mechanically thin films[J]. Applied Surface Science, 2004, 238: 121-124.
5. VEIKO V P, SHAKHO E A, VOLKOVYSKI B V. Peculiarities of steam laser cleaning[J]. SPIE, 2002, 4426: 322-325.
6. WATKINS K G, CURRAN C, LEE J M. Two new mechanisms for laser cleaning using Nd:YAG sources[J]. Journal of Cultural Heritage, 2003, 4: 59-64.
7. ARNOLD N. Theoretical description of dry laser cleaning[J]. Applied Surface Science, 2003, (208-209): 15-22.
8. KONOV V I, KONONENKO V V, LOMONOSOV A M, et al. Laser induced surface cleaning from diamond particles[J]. SPIE, 2002, 4426: 347-350.
9. LUK'YANCHUK B S, ZHENG Y W, LU Y F. Particle on the surface: Basic physical problems related to laser cleaning[J]. SPIE, 2002, 4426: 284-289.
10. KANE D, FERNANDES A. Laser cleaning of particles from surfaces-issues relating to sample preparation[J]. SPIE, 2002, 4426: 334-339.
11. FERNANDES A, KANE D. Dry laser cleaning threshold fluence-How can it be measured accurately[J]. SPIE, 2002, 4426: 290-295.
12. TAKAI M, SUZUKI N, YAVAS O, et al. Wavelength dependence of laser cleaning for field emitter arrays[J]. SPIE, 2002, 4426: 302-307.
13. TAN D H, LU D SH. Experiment studies of excimer laser cleaning of grease-contaminated Si substrate[J]. Laser Technology, 1995, 19(5): 319-320. (in Chinese)
14. TAN D H, LU D SH. A finite element analysis of the temperature distribution on a substrate surface during laser cleaning[J]. J. Huazhong Univ. of Sci and Tech, 1996, 24: 50-53. (in Chinese)
15. SHI X K, XU CH Y. Laser cleaning of soft colloid particles on optical substrates surface[J]. Aviation Precision Manufacturing Technology, 2000, 36(3): 12-15. (in Chinese)
16. STRATTON J A. Electromagnetic theory[M]. New York and London: McGrawHill, 1991.
17. KERKER M. The scattering of light[M]. New York and London: Academic Press, 1969.
18. HULST H C V. Light scattering by small particles[M]. New York: Dower Publ, 1981.