Synthesis and characterization of vanadium oxide films by post-oxidation and reactive sputtering

Materials Science and Engineering: B

Volumn 141, Issue 3, 2007, Pages 108-114

  Khodin, A ^a,b   Hwang, Hak In ^a   Hong, Sung Min ^a   Zalessky, V ^b   Leonova, T ^b   Belov, M ^b   Outkina, E ^c  

^a Korea Electronic Technology Institute (KETI)   (South Korea)

^b B I STEPANOV INSTITUTE OF PHYSICS   (Belarus)

^c BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

Author keywords

Film deposition; Metal insulator transitions; Oxidation; Sputtering; Thin films; Vanadium oxide

Indexed keywords

OXIDATION; PHASE TRANSITIONS; REACTIVE SPUTTERING; VACUUM DEPOSITION; VANADIUM COMPOUNDS;

METAL-INSULATOR TRANSITIONS; OXYGEN-CONTAINING PLASMA;

METALLIC FILMS;

EID: 34547949722     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.06.026     Document Type: Article

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