Structural and electrical properties of sputtered vanadium oxide thin films for applications as gas sensing material

Journal of Applied Physics

Volumn 81, Issue 6, 1997, Pages 2709-2714

  Manno, D ^a   Serra, A ^a   Di Giulio, M ^a   Micocci, G ^a   Taurino, A ^a   Tepore, A ^a   Berti, D ^b  

^a UNIVERSITY OF SALENTO   (Italy)

^b Eniricerche SpA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DIFFRACTION; ELECTRIC PROPERTIES; MORPHOLOGY; NITROGEN OXIDES; OHMIC CONTACTS; PRESSURE EFFECTS; SPUTTERING; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY; VANADIUM COMPOUNDS;

HALL EFFECT MEASUREMENT; HALL MOBILITY; NANODIFFRACTION; REACTIVE RADIOFREQUENCY SPUTTERING; VANADIUM OXIDE;

THIN FILMS;

EID: 0031094622     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363973     Document Type: Article

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