Hollow-cathode based electrical discharge in atmospheric pressure water vapor at wide range of temperature

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 A, 2006, Pages 7888-7893

  Koo, Il Gyo ^a   Lee, Woong Moo ^a  

^a Ajou University   (South Korea)

Author keywords

Atmospheric pressure discharge; Discharge in water vapor; High pressure discharge; Micro hollow discharge; Micro hollow electrodes; Plasma emission spectroscopy

Indexed keywords

ATMOSPHERIC PRESSURE; CATHODES; DISCHARGE LAMPS; THERMAL EFFECTS; WATER VAPOR;

ATMOSPHERIC PRESSURE DISCHARGES; DISCHARGE IN WATER VAPOR; HIGH PRESSURE DISCHARGES; MICRO HOLLOW DISCHARGE; MICRO HOLLOW ELECTRODES; PLASMA EMISSION SPECTROSCOPY;

ELECTRIC DISCHARGES;

EID: 34547917226     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.7888     Document Type: Article

References (29)

1. I. G. Koo and W. M. Lee: J. Nucl. Sci. Technol. 42 (2005) 717.
2. X. Chen, S. L. Suib, Y. Hayashi and H. Matsumoto: J. Catal. 201 (2001) 198.
3. I. G. Koo, M. S. Lee, J. M. Lee and W. M. Lee: Proc. 17th Int. Symp. Plasma Chemistry, Toronto, 2005, p. 271.
4. O. Sakai, Y. Kishimoto and K. Tachibana: J. Phys. D 38 (2005) 431.
5. I. G. Koo, M. S. Lee and W. M. Lee: Thin Solid Films 506-507 (2006) 350.
6. M. Laroussi, I. Alexeff, J. P. Richardson and F. F. Dyer: IEEE Trans. Plasma Sci. 30 (2002) 158.
7. S. Okazaki, M. Kogoma, M. Uehara and Y. Kimura: J. Phys. D 26 (1993) 889.
8. F. Massines, A. Rabehi, P. Decomps, R. B. Gadri, P. Seger and C. Mayoux: J. Appl. Phys. 83 (1998) 2950.
9. S. Pekarek, V. Kriha, M. Simek, R. Balek and F. Haintz: Plasma Source Sci. Technol, 8 (1999) 513.
10. K. H. Schoenbach, R. Verhappen, T. Tessnow, F. E. Peterkin and W. W. Byszewski: Appl. Phys. Lett. 68 (1996) 13.
11. K. H. Schoenbach, A. El-Habachi, W. Shi and M. Ciocca: Plasma Sources Sci. Technol. 6 (1997) 468.
12. I. G. Koo and W. M. Lee: Plasma Chem. Plasma Process. 24 (2004) 537.
13. K. H. Becker, U. Kogelschatz, K. H. Scheonbach and R. J. Barker: Non-Equilibrium Air Plasmas at Atmospheric Pressure (Institute of Physics Publishing, Bristol, 2005) p. 174.
14. R. Ono and T. Oda: J. Appl. Phys. 93 (2003) 5876.
15. J. Chen and P. Wang: IEEE Trans. Plasma Sci. 33 (2005) 808.
16. O Motret, C. Hilbert, S. Pellerin and J. M. Pouvesle: J. Phys. D 33 (2000) 1493.
17. A. Neau, A. A. Khalili, S. Rosen, A. Le Padellec, A. M. Derkatch, W. Shi, L. Vikor, M. Larsson, J. Semaniak, R. Thomas, M. B. Nagard, K. Andersson, H. Denared and M. af Ugglas: J. Chem. Phys. 113 (2000) 1762.
18. W. L. Morgan: J. Chem. Phys. 80 (1984) 4564.
19. J. M. Warman, E. S. Sennhauser and D. A. Armstrong: J. Chem. Phys. 70 (1979) 995.
20. M. L. Jensen, R. C. Bilodeau, O. Heber, H. B. Pedersen, C. P. Safvan, X. Urbain, D. Zajfman and L. H. Andersen: Phys. Rev. A 60 (1999) 2970.
21. O. Sakai and K. Inoguchi: J. Phys. D 36 (2003) 2891.
22. S. C. Brown: Basic Data of Plasma Physics/American Vacuum Society Classics (American Institute of Physics, New York, 1994) p. 130.
23. H. S. Uhm: Phys. Plasma 6 (1999) 623.
24. C. O. Laux, T. G. Spence, C. H. Kruger and R. N. Zare: Plasma Source Sci. Technol. 12 (2003) 125.
25. B. Sun, M. Sato and J. S. Clements: J. Electrostat. 39 (1997) 189.
26. M. Ivkovic, S. Jovicevic and N. Konjevic: Spectrochim. Acta, Part B 59 (2004) 591.
27. S. Jovicevic, M. Ivkovic, Z. Pavlovic and N. Konjevic: Spectrochim, Acta, Part B 55 (2000) 1879.
28. M. A. Lieberman and A. J. Lichtenberg: Principles of Plasma Discharges and Materials Processing (John Wiley & Sons, New York, 1994) p. 132.
29. E. Nasser: Fundamentals of Gaseous Ionization and Plasma Electronics (John Wiley & Sons, New York, 1970) p. 192.