Hydrogen isotope exchange reactions in an atmospheric pressure discharge utilizing water as carrier gas

Plasma Chemistry and Plasma Processing

Volumn 24, Issue 4, 2004, Pages 537-554

  Koo, I G ^b   Lee, W M ^a  

^a Ajou University   (South Korea)

^b NONE

Author keywords

AC electrical discharge; Atmospheric pressure discharge; Emission spectra; FTIR; Hydrogen isotope exchange reaction

Indexed keywords

ATMOSPHERIC PRESSURE; DIELECTRIC DEVICES; ELECTRIC DISCHARGES; ELECTROCHEMICAL ELECTRODES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; ION EXCHANGE; ISOTOPES; MIXTURES;

AC ELECTRICAL DISCHARGE; ATMOSPHERIC PRESSURE DISCHARGE; EMISSION SPECTRA; HYDROGEN ISOTOPE EXCHANGE REACTIONS;

REACTION KINETICS;

EID: 12344276340     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-004-7931-9     Document Type: Article

References (27)

1. A. R. Hochstin, Kinetic Processes in Gases and Plasma, Academic Press 1969.
2. B. M. Penetrante and S. E. Schultheis, Non-Thermal Plasma Techniques for Pollution Control, Springer-Verlag, Berlin, 1993.
3. B. D. Blaustein, Chemical Reactions in Electrical Discharge, Adv. Chem. Ser. 80, ACS, 1967.
4. J. Lawton and F. J. Weinberg, Electrical Aspects of Combustion, Clarendon Press, Oxford, 1969.
5. J. R. Hollahan and A. T. Bell, Techniques and Applications of Plasma chemistry, John Wiley & Sons, New York, 1974.
6. H. J. Kim, Y. D. Park, and W. M. Lee, Plasma Chem. Plasma Process. 20, 259 (2000).
7. J. P. Butler, J. H. Rolston, and W. H. Stevens, in Proceeding of the Symposium on Separation of Hydrogen Isotopes, (H. K. Rae, ed.), ACS Symp. - Ser. 68, 93 (1978).
8. J. H. Rolston, J. den Hartog, and J. P. Butler, J. Phys. Chem. 80, 1064 (1976).
9. H. Yang, K. S. Shin, and W. Gardiner, Chem. Phys. Lett. 207, 69 (1993).
10. K. H. Schoenbach, R. Verhappen, T. Tessnow, F. E. Peterkin, and W. W. Byszewski, Appl. Phys. Lett. 68, 13 (1996).
11. K. H. Schoenbach, A. El-Habachi, M. M. Moselhy, W. Shi, and M. Ciocca, Plasma Sources Sci. Technol. 6, 468 (1997).
12. Y. Guo and F. C. Hong, Appl. Phys. Lett. 82, 337 (2003).
13. Z. Yu, K. Hoshimiya, J. D. Williams, S. F. Polvinen, and G. J. Collins, Appl. Phys. Lett. 83, 854 (2003).
14. M. Miclea, K. Kunze, J. Franzke, and K. Niemax, Spectrochim. Acta. Ed. B57, 1585 (2002).
15. S. Kanazawa, M. Kogoma, T. Moriwaki, and S. Okazaki, J. Phys. D: Appl. Phys. 21, 838 (1988).
16. S. Pkazaki, M. Kogoma, M. Uehara, and Y. Kimura, J. Phys. D: Appl. Phys. 26, 889 (1993).
17. M. Laroussi, I. Alexeff, J. P. Richardson, and F. F. Dyer, IEEE Trans. Plasma Sci. 30, 158 (2002).
18. B. Sun, M. Sato, and J. S. Clements, J. Electrostat. 39, 189 (1997).
19. B. Benstaali, P. Boubert, B. G. Cheron, A. Addou, and J. L. Brisset, Plasma Chem. Plasma Process. 22, 553 (2002).
20. A. Ricard, Ph. Décomps, and F. Massines, Surface Coat. Technol. 112, 1 (1999).
21. C. O. Laux, T. G. Spence, C. H. Kruger, and R. N. Zare, Plasma Sources Sci. Technol. 12, 125 (2003).
22. M. A. Malik, A. Ghaffar, and S. A. Malik, Plasma Sources Sci. Technol. 10, 82 (2001).
23. F. P. Del Greco and F. Kaufman, Disc. Faraday Soc. 33, 128 (1962).
24. F. Kaufman, Chemical Reactions in Electrical Discharge, Adv. Chem. Ser. 80, ACS, (1967), p. 29.
25. V. S. Gathen and H. F. Dobele, Plasma Chem. Plasma Process. 16, 461 (1996).
26. R. Schinke, V. Engel, and V. Staemmler, J. Chem. Phys. 83, 4522 (1985).
27. R. D. Levine and R. B. Bernstein, Molecular Reaction Dynamics and Chemical Reactivity, Oxford University Press, Oxford, 1987, p. 14.