Low temperature plasma-chemical treatment of PdCl2 film by atmospheric pressure hydrogen plasma

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 350-354

  Koo, Il Gyo ^a   Lee, Myoung Seok ^a   Lee, Woong Moo ^a  

^a Ajou University   (South Korea)

Author keywords

Atmospheric pressure plasma; Hydrogen plasma; Pd film; PdCl2 film; Plasma chemical reaction

Indexed keywords

ALUMINA; DIELECTRIC MATERIALS; HIGH TEMPERATURE EFFECTS; PALLADIUM COMPOUNDS; PLASMA APPLICATIONS; PLASMAS; POLYMERS; SCANNING ELECTRON MICROSCOPY; SOLUTIONS; X RAY DIFFRACTION ANALYSIS;

ATMOSPHERIC PRESSURE PLASMAS; HYDROGEN PLASMAS; PD FILM; PDCL2 FILMS; PLASMA-CHEMICAL REACTION;

THIN FILMS;

EID: 33645283863     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.347     Document Type: Conference Paper

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