Effective-mass anomalies of strained silicon thin films: Surface and confinement effects

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 5 B, 2007, Pages 3273-3276

  Yamauchi, Jun ^a,b   Matsuno, Shunichi ^c  

^a KEIO UNIVERSITY   (Japan)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^c TOKAI UNIVERSITY   (Japan)

Author keywords

Ab initio; Confinement; Density functional calculation; Effective mass; First principles calculation; Si; SOI; Strain; Substrate thickness

Indexed keywords

APPROXIMATION THEORY; CHANNEL CAPACITY; DENSITY FUNCTIONAL THEORY; SILICON; SURFACE ANALYSIS;

EFFECTIVE MASS; FIRST-PRINCIPLES CALCULATIONS; SUBSTRATE THICKNESS;

THIN FILMS;

EID: 34547905464     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.3273     Document Type: Article

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