Copper-doped indium tin oxide electrode for organic light-emitting devices

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 4 A, 2007, Pages 1640-1642

  Satoh, Toshikazu ^a   Fujikawa, Hisayoshi ^a  

^a Rd Management Section   (Japan)

Author keywords

Efficiency; ITO:Cu; Long term stability; Organic light emitting device

Indexed keywords

AMORPHOUS FILMS; DOPING (ADDITIVES); ELECTROCHEMICAL ELECTRODES; ELECTRONIC STRUCTURE; INDIUM ALLOYS; MAGNETRON SPUTTERING;

COPPER DOPING; FILMS DEPOSITION; INDIUM TIN OXIDE;

ORGANIC LIGHT EMITTING DIODES (OLED);

EID: 34547904719     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.1640     Document Type: Article

References (16)

1. C. W. Tang and S. A. VanSlyke: Appl. Phys. Lett. 51 (1987) 913.
2. K. Sugiyama, H. Ishii, Y. Ouchi, and K. Seki: J. Appl. Phys. 87 (2000) 295.
3. F. Li, H. Tang, J. Shinar, O. Resto, and S. Z. Weisz: Appl. Phys. Lett. 70 (1997) 2741.
4. M. Ishii, T. Mori, H. Fujikawa, S. Tokito, and Y. Taga: J. Lumin. 87-89 (2000) 1165.
5. L. S. Hung, L. R. Zheng, and M. G. Mason: Appl. Phys. Lett. 78 (2001) 673.
6. S. A. VanSlyke, C. H. Chen, and C. W. Tang: Appl. Phys. Lett. 69 (1996) 2160.
7. S. Tokito, K. Noda, and Y. Taga: J. Phys. D 29 (1996) 2750.
8. I. M. Chan and C. N. Hong: Thin Solid Films 444 (2003) 254.
9. T. H. Chen, Y. Liou, T. J. Wu, and J. Y. Chen: Appl. Phys. Lett. 85 (2004) 2092.
10. W. Hu, K. Manabe, T. Furukawa, and M. Matsmura: Appl. Phys. Lett. 80 (2002) 2640.
11. S. Tokito, H. Tanaka, A. Okada, and Y. Taga: Appl. Phys. Lett. 69 (1996) 878.
12. K. Sugiyama, H. Ishii, Y. Ouchi, and K. Seki: J. Appl. Phys. 87 (2000) 295.
13. I. Hamberg and C. G. Granqvist: J. Appl. Phys. 60 (1986) R123.
14. H. Ishii, K. Sugiyama, E. Ito, and K. Seki: Adv. Mater. 11 (1999) 605.
15. M. Ishii and Y. Taga: Appl. Phys. Lett. 80 (2002) 3430.
16. H. Aziz, Z. D. Popovic, N. X. Hu, A. M. Hor, and G. Xu: Science 19 (1999) 1900.