Cooperative molecular field effect on the surface potential of tris(8-quinolinato)aluminum films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 4 B, 2007, Pages 2740-2744

  Kajimoto, Norifumi ^a   Manaka, Takaaki ^a   Iwamoto, Mitsumasa ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Alq3; Electron injection; Electrostatic energy; Surface potential

Indexed keywords

ALUMINUM; CARRIER MOBILITY; ELECTROCHEMICAL ELECTRODES; ELECTROSTATICS; MOLECULAR MODELING; SURFACE POTENTIAL;

ELECTROSTATIC ENERGY; MOLECULAR FIELD EFFECT; ORGANIC FILMS;

METALLIC FILMS;

EID: 34547899235     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.2740     Document Type: Article

References (20)

1. S. M. Sze: Physics of Semiconductor Devices (Wiley-Interscience, New York, 1981) 2nd ed.
2. M. A. Lampert and P. Mark: Current Injection in Solidi (Academic, New York, 1970).
3. G. M. Sessler: Electrets (Springer-Verlag, New York, 1987).
4. M. Iwamoto: in Conjugated Polymer and Molecular InterfacesScience and Technology for Photonic and Optoelectronic Applications, ed. W. R. Salaneck, K. Seki, A. Khan, and J. J. Pireaux (Marcel Dekker, New York, 2002).
5. E. Ito, Y. Washizu, N. Hayashi, H. Ishii, N. Matsuie, K. Tsuboi, Y. Ouchi, Y. Harima, K. Yamashita, and K. Seki: J. Appl. Phys. 92 (2002) 7306.
6. K. Sugi, H. Ishii, Y. Kimura, M. Niwano, E. Ito, Y. Washizu, N. Hayashi, Y. Ouchi, and K. Seki: Thin Solid Films 464-465 (2004) 412.
7. K. Yoshizaki, T. Manaka, and M. Iwamoto: J. Appl. Phys. 97 (2005) 023703.
8. N. Kajimoto, T. Manaka, and M. Iwamoto: J. Appl. Phys. 100 (2006) 053707.
9. N. Kajimoto, T. Manaka, and M. Iwamoto: Chem. Phys. Lett. 430 (2006) 340.
10. V. S. L'vov, R. Naaman, V. Tiberkevich, and Z. Vager: Chem. Phys. Lett. 381 (2003) 650.
11. D. Cahen, R. Naaman, and Z. Vager: Adv. Funct. Mater. 15 (2005) 1571.
12. Y. Suzue, T. Manaka, and M. Iwamoto: Jpn. J. Appl. Phys. 44 (2005) 561.
13. R. J. Curry, W. P. Gillin, J. Clarkson, and D. N. Batchelder: J. Appl. Phys. 92 (2002) 1902.
14. A. Curioni, M.. Boero, and W. Andreoni: Chem. Phys. Lett. 294 (1998) 263.
15. K. L. Wang, B. Lai, M. Lu, X. Zhou, L. S. Liao, X. M. Ding, X. Y. Hou, and S. T. Lee: Thin Solid Films 363 (2000) 178.
16. N. Kajimoto, T. Manaka, and M. Iwamoto: Proc. Int. Symp. SuperFunctionality Organic Devices (IPAP, Tokyo, 2005) IPAP Conf. Ser. No. 6, p. 184.
17. P. E. Burrows, Z. Shen, V. Bulovic, D. M. McCarty, S. R. Forrest, J. A. Cronin, and M. E. Thompson: J. Appl. Phys. 79 (1996) 7991.
18. K. Tamano, D. C. Cho, T. Mori, T. Mizutani, and M. Sugiyama: Thin Solid Films 438 (2003) 182.
19. J. Steiger, R. Schmechel, and H. von Seggern: Synth. Met. 129 (2002) 1.
20. K. Sugiyama, D. Yoshimura, T. Miyamae, T. Miyazaki, H. Ishii, Y. Ouchi, and K. Seki: J. Appl. Phys. 83 (1998) 4928.