Reliability analysis of ultra low-temperature polycrystalline silicon thin-film transistors

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 3 B, 2007, Pages 1303-1307

  Ueno, Hitoshi ^a   Sugawara, Yuta ^a   Yano, Hiroshi ^a   Hatayama, Tomoaki ^a   Uraoka, Yukiharu ^a   Fuyuki, Takashi ^a   Jung, Ji Sim ^b   Park, Kyung Bae ^b   Jong Man, K I M ^b   Kwon, Jang Yeon ^b   Noguchi, Takashi ^c  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b Advanced Institute of Technology   (South Korea)

^c UNIVERSITY OF THE RYUKYUS   (Japan)

Author keywords

Hot carrier; Joule heating; Polycrystalline silicon thin film transistor; Reliability; Ultra low temperature process

Indexed keywords

DRAIN CURRENT; ELECTRIC FIELD EFFECTS; HOT CARRIERS; JOULE HEATING; LOW TEMPERATURE EFFECTS; POLYSILICON; RELIABILITY ANALYSIS;

AVALANCHE CONDITION; DEGRADATION MODE; GATE VOLTAGE; ULTRA LOW-TEMPERATURE PROCESS;

THIN FILM TRANSISTORS;

EID: 34547895952     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.1303     Document Type: Article

References (11)

1. M. Furuta, S. Maegawa, H. Sano, T. Yoshioka, Y. Uraoka, H. Tsutsu, I. Kobayashi, T. Kawamura, and Y. Miyata: Euro Display Tech. Dig., 1996, p. 547.
2. M. Miyasaka, S. Nebashi, and T. Shimoda: ITC'06, 2006, p. 16.
3. T. Noguchi, J. S. Jung, J. M. Kim, K. B. Park, H. Lim, D. Y. Kim, H. S. Cho, X. X. Zhang, H. X. Yin, and W. X. Xianyu: AMLCD'05, 2005, p. 281.
4. D. Y. Kim, J. Y. Kwon, J. S. Jung, J. M. Kim, K. B. Park, H. Lim, H. S. Cho, and T. Noguchi: AMLCD'05, 2005, p. 299.
5. J. S. Jung, J. Y. Kwon, Y. Park, D. Y. Kim, H. S. Cho, K. B. Park, W. Xianyu, and T. Noguchi: J. Korean Phys. Soc. 45 (2004) S863.
6. S. Inoue and H. Ohshima: IEDM Tech. Dig, 1996, p. 781.
7. Y. Uraoka, T. Hatayama, T. Fuyuki, T. Kawamura, and T. Tsuchihashi: Jpn. J. Appl. Phys. 40 (2001) 2833.
8. Y. Uraoka, Y. Morita, H. Yano, T. Hatayama, and T. Fuyuki: Jpn. J. Appl. Phys. 41 (2002) 5894.
9. T. Fuyuki, K. Kitajima, H. Yano, T. Hatayama, Y. Uraoka, S. Hashimoto, and Y. Morita: Thin Solid Films 487 (2005) 216
10. S. Inoue, S. Takenaka, and T. Shimoda: Jpn. J. Appl. Phys. 42 (2003) 4213.
11. S. Inoue, M. Kimura, and T. Shimoda: Jpn. J. Appl. Phys. 42 (2003) 1168.