New phase modulators for next-generation low-temperature crystallization method of Si films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 A, 2006, Pages 7753-7760

  Taniguchi, Yukio ^a   Katou, Tomoya ^a   Hiramatsu, Masato ^a   Matsumura, Masakiyo ^a  

^a Advanced LCD Technologies Development Center Co Ltd   (Japan)

Author keywords

Crystallization; Depth of focus; Exclmer laser; Phase modulator; Thin film transistor

Indexed keywords

CRYSTALLIZATION; EXCIMER LASERS; QUARTZ; SILICON; THIN FILM TRANSISTORS;

LIGHT INTENSITY; PHASE ADVANCEMENT; PHASE MODULATORS; QUARTZ PLATES;

MODULATORS;

EID: 34547894268     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.7753     Document Type: Article

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