Observation of initial oxidation on Si(110)-16 × 2 surface by scanning tunneling microscopy

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 5 B, 2007, Pages 3239-3243

  Togashi, Hideaki ^a   Tarahashi, Yuya ^a   Kato, Atsushi ^a   Konno, Atsushi ^a   Asaora, Hidehito ^b   Suemitsu, Maki ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Initial oxidation processes; Scanning tunneling microscopy; Si(110) 16 2 surface

Indexed keywords

ANNEALING; IMAGE ANALYSIS; OXIDATION; SCANNING TUNNELING MICROSCOPY; SILICON;

EMPTY-STATE IMAGES; INITIAL OXIDATION PROCESSES; OXIDIZED SURFACES; ROOM TEMPERATURE (RT);

SURFACE ANALYSIS;

EID: 34547891938     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.3239     Document Type: Article

References (23)

1. T. Sato, Y. Takeishi, H. Hara, and Y. Okamoto: Phys. Rev. B 4 (1971) 1950.
2. R. Izawa, T. Kuse, S. Iijima, and E. Takeda: IEDM, Tech. Dig., 1987, p. 38.
3. M. Suemitsu, A. Kato, H. Togashi, A. Konno, Y. Yamamoto, Y. Teraoka, A. Yoshigoe, and Y. Narita: Jpn. J. Appl. Phys. 46 (2007) 1888.
4. M. Suemitsu, A. Kato, H. Togashi, A. Konno, Y. Yamamoto, Y. Teraoka, A. Yoshigoe, Y. Enta, and Y. Narita: ECS Trans. 3 (2006) No. 2, 311.
5. Y. Yamamoto: Surf. Sci. 313 (1994) 155.
6. T. An, M. Yoshimura, I. Ono, and K. Ueda: Phys. Rev. B 61 (2000) 3006.
7. H. Togashi, Y. Yamamoto, S. Goto, Y. Takahashi, T. Nakano, A. Kato, S. Hasegawa, A. Konno, M. Suemitsu, H. Asaoka, A. Yoshigoe, and Y. Teraoka: in preparation for publication.
8. H. Okuyama, T. Yamada, and T. Aruga: Jpn. J. Appl. Phys. 44 (2005) 5362.
9. Ph. Avouris, I.-W. Lyo, and F. Bozso: J. Vac. Sci. Technol. B 9 (1991) 424.
10. T. Uchiyama and M. Tsukada: Phys. Rev. B 53 (1996) 7917.
11. R. Martel, Ph. Avouris, and I.-W. Lyo: Science 272 (1996) 385.
12. K. Sakamoto, S. T. Jemander, G. V. Hansson, and R. I. G. Uhrberg: Phys. Rev. B 65 (2002) 155305.
13. B. D. Yu, Y. J. Kim, J. Jeon, H. Kim, H. W. Yeom, I. W. Lyo, K. Kong, Y. Miyamoto, O. Sugino, and T. Ohno: Phys. Rev. B 70 (2004) 033307.
14. K. Miki and K. Yamabe: JSAP Thin Film Surf. Phys. Div. News Lett. No. 108, p. 22 (2000) [in Japanese].
15. Y. Ono, M. Tabe, and H. Kageshima: Phys. Rev. B 48 (1993) 14291.
16. J. R. Engstrom, D. J. Bonser, M. M. Nelson, and T. Engel: Surf. Sci. 256 (1991) 317.
17. A. Yoshigoe, K. Moritani, and Y. Teraoka: Surf. Sci. 566 (2004) 1124.
18. M. Suemitsu, Y. Enta, and Y. Miyamoto: Phys. Rev. Lett. 82 (1999) 2334.
19. H. Togashi, H. Asaoka, T. Yamazaki, and M. Suemitsu: Jpn. J. Appl. Phys. 44 (2005) L1377.
20. Y. Enta, Y. Miyanishi, H. Irimachi, M. Niwano, M. Suemitsu, N. Miyamoto, E. Shigemasa, and H. Kato: J. Vac. Sci. Technol. A 16 (1998) 1716.
21. K. Kato and T. Uda: Phys. Rev. B 62 (2000) 15978.
22. S.-H. Lee and M.-H. Kang: Phys. Rev. Lett. 82 (1999) 968.
23. M. Suemitsu, H. Togashi, A. Kato, Y. Takahashi, A. Konno, Y. Yamamoto, Y. Teraoka, A. Yoshigoe, and H. Asaoka: to be presented at Materials Research Society, 2007.