Structure and electric properties of TiO2 films prepared by cold plasma torch under atmospheric pressure

Materials Science and Engineering B

Volumn 41, Issue 1, 1996, Pages 143-147

  Ha, H ^a   Moon, B K ^b   Horiuchi, T ^c   Inushima, T ^c   Ishiwara, H ^a   Koinuma, H ^a  

^a Tokyo Institute of Technology ^*  (Japan)

^b SONY CORPORATION   (Japan)

^c TOKAI UNIVERSITY   (Japan)

Author keywords

Boulders; Cold plasma torch; Open air conditions; TiO2 Film

Indexed keywords

AMORPHOUS MATERIALS; ELECTRIC PROPERTIES; PLASMA TORCHES; STOICHIOMETRY; TITANIUM DIOXIDE;

BOULDERS; COLD PLASMA TORCH; OPEN AIR CONDITIONS;

METALLIC FILMS;

EID: 0038619705     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01641-8     Document Type: Article

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