Changes in surface stress of gold electrode during underpotential deposition of copper

Journal of Solid State Electrochemistry

Volumn 11, Issue 10, 2007, Pages 1365-1373

  Seo, Masahiro ^a   Yamazaki, Makiko ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Bending beam method; Co adsorption of anions; Gold electrode; Surface stress; Underpotential deposition of copper

Indexed keywords

BENDING BEAM METHOD; CHLORIDE IONS; PERCHLORIC ACID; UNDERPOTENTIAL DEPOSITION;

COMPRESSIVE STRESS; COPPER; GOLD; STRAIN; STRESS ANALYSIS;

ELECTROCHEMICAL ELECTRODES;

EID: 34547642677     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-007-0294-4     Document Type: Article

References (46)

1. Herrero E, Buller LJ, Abruna HD (2001) Chem Rev 101:1897
2. Shuttleworth R (1950) Proc R Soc Lond A 63:444
3. Lipkowski J, Schmickler W, Kolb DM, Parsons R (1998) J Electroanal Chem 452:193
4. Láng GG, Heusler KE (1994) J Electroanal Chem 377:1
5. Láng GG, Heusler KE (1999) J Electroanal Chem 472:168
6. Gutman EM (1995) J Phys Condens Matter 7:L663
7. Ueno K, Seo M (1999) J Electrochem Soc 146:1496
8. Seo M, Serizawa Y (2003) J Electrochem Soc 150:E472
9. Friesen C, Dimitrov N, Cammarata RC, Sieradzki K (2001) Langmuir 17:807
10. Toney MF, Gordon JG, Samant, Borges GL, Melroy OW (1992) Phys Rev B 45:9362
11. Seo M, Yamazaki M (2004) J Electrochem Soc 151:E276
12. Shi Z, Lipkowski J (1994) J Electroanal Chem 364:289
13. Shi Z, Lipkowski J (1994) J Electroanal Chem 365:303
14. Shi Z, Lipkowski J, Gamboa M, Zelenay P, Wieckowski A (1994) J Electroanal Chem 366:317
15. Shi Z, Wu S, Lipkowski J (1995) Electrochim Acta 40:9
16. Shi Z, Wu S, Lipkowski J (1995) J Electroanal Chem 384:171
17. Magnussen OM, Hotlos J, Nichols RJ, Kolb DM, Behm RJ (1990) Phys Rev Lett 64:2929
18. Hachiya T, Honbo H, Itaya K (1991) J Electroanal Chem 315:275
19. Hotlos J, Magnussen OM, Behm RJ (1995) Surf Sci 335:129
20. Toney MF, Howard JN, Richer J, Borges GL, Gordon JG II, Melroy OR (1995) Phys Rev Lett 75:4472
21. Melroy OR, Borges GL, Blum L, Abruna HD, Albarelli MJ, Samant MG, McMillan M, White JH, Gordon JG II (1988) Langmuir 4:728
22. Tadjeddine A, Tourillon G, Guay D (1991) Electrochim Acta 36:1859
23. Wu S, Lipkowski J, Tyliszczak T, Hitchcock AP (1995) Prog Surf Sci 50:227
24. Trimble TM, Cammarata RC, Sieradzaki K (2003) Surf Sci 531:8
25. Stoney GG (1909) Proc R Soc Lond A 32:172
26. Láng GG, Seo M (2000) J Electroanal Chem 490:98
27. Láng GG, Ueno K, Ujvári M, Seo M (2000) J Phys Chem B 104:2785
28. Láng GG, Seo M, Heusler KE (2005) J Solid State Electrochem 9:347
29. Rokob EA, Láng GG (2005) Electrochim Acta 51:93
30. Batina N, Will T, Kolb DM (1992) Faraday Discuss 94:93
31. Green MP, Hanson KP (1992) J Vac Sci Technol A 10:3012
32. Tadjeddine A, Lahrichi A, Tourillon G (1993) J Electroanal Chem 360:261
33. Borges GL, Kanazawa KK, Gordon JGII, Ashley K, Richer J (1993) J Electroanal Chem 364:281
34. Watanabe M, Uchida H, Miura M, Ikeda N (1994) J Electroanal Chem 384:191
35. Manne S, Hansma PK, Massie J, Elings VB, Gewirth AA (1991) Science 251:183
36. Ikemiya N, Miyaoka S, Hara S (1994) Surf Sci 311:L641
37. Trimble T, Tang L, Vasilljevic N, Dimitrov, van Schilfgaarde M, Friesen C, Thompson CV, Seel SC, Floro JA, Sieradzki K (2005) Phys Rev Lett 95:166106
38. Kongstein OE, Bertocci U, Stafford GR (2005) J Electrochem Soc 152:C116
39. Láng GG, Ujvári M, Horányi G (2002) J Electroanal Chem 522:179
40. Doblhofer K, Wasle S, Soares DM, Weil KG, Weinberg G, Ertl G (2003) Z Phys Chem 217:479
41. Doblhofer K, Wasle S, Soares DM, Weil KG, Ertl G (2003) J Electrochem Soc 150:C657
42. Ibach H (1994) J Vac Sci Technol A 12:2240
43. Ibach H (1997) Surf Sci Rep 29:193
44. Haiss W, Nichols RJ, Sass JK, Charle KP (1998) J Electroanal Chem 452:199
45. Wilms M, Broekmann P, Stuhlmann C, Wendelt K (1988) Surf Sci 416:121
46. Gregory JE, Gao X, Weaver MJ (1994) J Electroanal Chem 375:357