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Zeitschrift fur Physikalische Chemie

Volumn 217, Issue 5, 2003, Pages 479-491

The influence of halide ions on the kinetics of electrochemical, copper(II) reduction

(6) Doblhofer, Karl a Wasle, Sabine a Soares, David M b Weil, Konrad G c Weinberg, Gisela a Ertl, Gerhard a

a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT (Germany)

b UNIVERSITY OF CAMPINAS (Brazil)

c PENNSYLVANIA STATE UNIVERSITY (United States)

Author keywords

Copper; Electrochemistry; Electroplating; Electrorefining; Halides; Mechanism

Indexed keywords

BROMINE COMPOUNDS; CHLORINE COMPOUNDS; COPPER; CYCLIC VOLTAMMETRY; ELECTROCHEMISTRY; ELECTRODES; ELECTROLYTES; ELECTROPLATING; IONS; MECHANISMS; QUARTZ CRYSTAL MICROBALANCES; REDUCTION; SULFURIC ACID;

CATHODIC REDUCTIONS; ELECTROCHEMICAL QUARTZ CRYSTAL MICROBALANCE; ELECTRODE SURFACES; ELECTROREFINING; HALIDES; NEGATIVE ELECTRODE; SMALL CONCENTRATION; TECHNICAL CONDITIONS;

COPPER COMPOUNDS;

BROMIDE; CHLORIDE ION; COPPER CHLORIDE; COPPER ION; COPPER SULFATE; ELECTROLYTE; HALIDE; HALOGEN; SULFUROUS ACID;

ADSORPTION; ARTICLE; CHEMICAL REACTION; CYCLIC POTENTIOMETRY; ELECTRIC POTENTIAL; ELECTROCHEMISTRY; ELECTRODE; KINETICS; REDUCTION; SURFACE PROPERTY;

EID: 0037617433 PISSN: 09429352 EISSN: None Source Type: Journal
DOI: 10.1524/zpch.217.5.479.20457 Document Type: Article

Times cited : (32)

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