Evaluation of thin film titanium nitride electrodes for electroanalytical applications

Electroanalysis

Volumn 19, Issue 10, 2007, Pages 1023-1031

  Kirchner, Carolina Nunes ^a,b   Hallmeier, Karl Heinz ^c   Szargan, Rüdiger ^c   Raschke, Thomas ^d   Radehaus, Christian ^d   Wittstock, Gunther ^a,b  

^a UNIVERSITY OF OLDENBURG   (Germany)

^b Institute for Chemistry and Biology of the Marine Environment (ICBM)   (Germany)

^c UNIVERSITY OF LEIPZIG   (Germany)

^d CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Approach curves; Feedback mode; Scanning electrochemical microscopy (SECM); Standard rate constant; Titanium nitride; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIGITAL STORAGE; DISSOLVED OXYGEN; FEEDBACK; KINETICS; METALLIC FILMS; MICROELECTRODES; PHOTOELECTRONS; PHOTONS; RATE CONSTANTS; REDOX REACTIONS; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SURFACE TREATMENT; THIN FILMS; TIN; TITANIUM NITRIDE;

APPROACH CURVE; ELECTROANALYTICAL APPLICATIONS; FEEDBACK MODE; REDOX COUPLE; SCANNING ELECTROCHEMICAL MICROSCOPY; STANDARD RATE CONSTANT; THIN LAYERS; THIN-FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 34547582116     PISSN: 10400397     EISSN: 15214109     Source Type: Journal    
DOI: 10.1002/elan.200703832     Document Type: Article

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