Conformal metal thin-film coatings in high-aspect-ratio trenches using a self-sputtered rf-driven plasma source

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 4, 2007, Pages 1227-1230

  Ji, L ^a,b   Kim, J K ^a,c   Ji, Q ^a   Leung, K N ^a   Chen, Y ^a   Gough, R A ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Etcheverry Hall MCI 730   (United States)

^c Korea Institute of Machine and Materials   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMAL COATING; CONTINUOUS WAVE MODE; DEEP-TRENCH COATING;

CONDUCTIVE MATERIALS; COPPER; INSULATING MATERIALS; THIN FILMS;

COATINGS;

EID: 34547579903     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2749527     Document Type: Article

References (10)

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