Sub-micron surface patterning by laser irradiation through microlens arrays

Journal of Materials Processing Technology

Volumn 192-193, Issue , 2007, Pages 328-333

  Lim, C S ^a   Hong, M H ^a,b   Lin, Y ^a   Chen, G X ^a   Senthil Kumar, A ^a   Rahman, M ^a   Tan, L S ^a   Fuh, J Y H ^a   Lim, G C ^c  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

^c SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

Femtosecond laser; Microlens arrays; Reactive ion etching (RIE); Surface patterning

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; IMAGE PROCESSING; LASER BEAM EFFECTS; MICROARRAYS; OPTOELECTRONIC DEVICES; PHOTORESISTS; REACTIVE ION ETCHING; ULTRASHORT PULSES; MICROOPTICS; MULTIPHOTON PROCESSES; OPTICAL COMMUNICATION; OPTICAL INSTRUMENT LENSES;

BEAM SPOTS; MICROLENS ARRAYS; OPTICAL MICROSCOPES; SURFACE PATTERNING;

LENSES; ULTRASHORT PULSES;

ATOMIC FORCE MICROSCOPE (AFM); EXPOSURE PARAMETERS; FOCUSED LASER BEAMS; MICRO-LENS ARRAYS; OPTICAL MICROSCOPES; PARALLEL IMAGE PROCESSING; PATTERNING TECHNIQUES; SURFACE PATTERNING;

EID: 34547522351     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2007.04.088     Document Type: Article

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