Coulomb-staircase observed in silicon-nanodisk structures fabricated by low-energy chlorine neutral beams

Journal of Applied Physics

Volumn 101, Issue 12, 2007, Pages

  Kubota, Tomohiro ^a   Hashimoto, Takeshi ^a   Takeguchi, Masaki ^b   Nishioka, Kensuke ^c   Uraoka, Yukiharu ^d   Fuyuki, Takashi ^d   Yamashita, Ichiro ^d,e   Samukawa, Seiji ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^d NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^e PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; ETCHING; NANOSTRUCTURED MATERIALS; POLYSILICON; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

NEUTRAL BEAM ETCHING (NBE); QUANTUM-EFFECT STRUCTURE; SILICON-NANODISK STRUCTURE; SURFACE REGION;

THIN FILMS;

EID: 34547394856     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2747226     Document Type: Article

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