Impact of plasma damage on cobalt silicidation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 1068-1072

  Kimura, T ^a   Kugimiya, K ^a   Ohchi, T ^a   Fuke, K ^a   Kataoka, T ^a   Tatsumi, T ^a   Kamide, Y ^a  

^a SONY CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; HYDROGEN; MONTE CARLO METHODS; MOS DEVICES; SHEET RESISTANCE; SILICIDES;

COBALT SILICIDATION; HIGH PEAK ENERGY; ION ENERGY DISTRIBUTION; PLASMA DAMAGE;

COBALT COMPOUNDS;

EID: 34547325865     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2739551     Document Type: Article

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