Ultrahigh vacuum-compatible fabrication and electrical characterization systems for environmentally sensitive metal oxide semiconductor capacitors

Review of Scientific Instruments

Volumn 78, Issue 6, 2007, Pages

  Billman, C A ^a   Walker, F J ^b  

^a ON SEMICONDUCTOR   (United States)

^b Yale University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL CHARACTERIZATION; ELECTRONIC DEVICES; NANOSCALE; VACUUM-COMPATIBLE FABRICATION;

CAPACITORS; DIELECTRIC MATERIALS; ELECTRIC PROPERTIES; FILM GROWTH; HETEROJUNCTIONS; MOLECULAR BEAM EPITAXY; VACUUM APPLICATIONS;

MOS DEVICES;

ARTICLE; ELECTRIC CAPACITANCE; ELECTROCHEMISTRY; ELECTRONICS; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; METHODOLOGY; REPRODUCIBILITY; SEMICONDUCTOR; SENSITIVITY AND SPECIFICITY; TRANSDUCER; VACUUM;

ELECTRIC CAPACITANCE; ELECTROCHEMISTRY; ELECTRONICS; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; REPRODUCIBILITY OF RESULTS; SEMICONDUCTORS; SENSITIVITY AND SPECIFICITY; TRANSDUCERS; VACUUM;

EID: 34547320464     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2748029     Document Type: Article

References (20)

1. R. A. McKee, F. J. Walker, and M. F. Chisholm, Phys. Rev. Lett. 81, 3114 (1998).
2. R. A. McKee, F. J. Walker, and M. F. Chisholm, Science 293, 468 (2001).
3. R. A. McKee, F. J. Walker, M. Buongiorno Nardelli, W. A. Shelton, and G. M. Stocks, Science 300, 1726 (2003).
4. S. K. Ghandhi, VLSI Fabrication Principles (Wiley, New York, 1994).
5. S. Wolf and R. N. Tauber, Silicon Processing for the VLSI Era Vol. 1: Processing Technology, (Lattice, California, 1986).
6. E. H. Nicollian and J. R. Brews, MOS (Metal Oxide Semiconductor) Physics and Technology, (Wiley, New York, 1982).
7. J. W. Erickson, Rev. Sci. Instrum. 60, 503 (1989).
8. E. J. P. Santos, Rev. Sci. Instrum. 63, 3789 (1992).
9. C. G. Wiegenstein and K. H. Schulz, Rev. Sci. Instrum. 68, 1812 (1997).
10. A. J. Dickie and R. A. Wolkow, American Physical Society March Meeting, 2004 (unpublished).
11. T. Gougousi, M. J. Kelly, and G. N. Parsons, J. Appl. Phys. 95, 1391 (2004).
12. J. Sanghun and H. Hwang, J. Appl. Phys. 93, 6393 (2003).
13. D. Niu, R. W. Ashcraft, and G. N. Parsons, Appl. Phys. Lett. 80, 3575 (2002).
14. Towne Technologies, Somerville, NJ (908) 722-9500.
15. Inficon, Syracuse, NY (314) 434-1100.
16. H. B. Michaelson, IBM J. Res. Dev. 22, 72 (1978).
17. Questar Corporation, New Hope, PA (215) 862-5277.
18. MDC-Vacuum Corporation, Hayward, CA (800) 443-8817.
19. SignaTone Corporation, Gilroy, CA (408) 848-2851.
20. Hewlett-Packard Japan, Ltd., HP 4284A Precision LCR Meter Operation Manual, 6th ed., 1998.