SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 257-260

Silicon stencil masks for Masked Ion Beam Lithography proximity printing

(8) Rangelow, I W c Shi, F c Hudek, P a Kostic, I a Hammel, E b Loschner H b Stengl, G b Cekan, E b

a INSTITUTE OF CHEMISTRY (Slovakia)

b Ion Microfabrication Systems GmbH (Austria)

c UNIVERSITY OF KASSEL (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DISPLAY DEVICES; ELECTRON BEAM LITHOGRAPHY; MASKS; PRINTING; REACTIVE ION ETCHING; SILICON; SILICON NITRIDE;

ALPHA ION PROJECTOR; ELECTROCHEMICAL ETCH STOP TECHNIQUES; FIELD EMITTER DISPLAYS; MASKS ION BEAM LITHOGRAPHY; PROXIMITY PRINTING; SILICON MEMBRANES; SILICON STENCIL MASKS;

ION BEAM LITHOGRAPHY;

EID: 0029753145 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/0167-9317(95)00240-5 Document Type: Article

Times cited : (8)

References (9)

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3
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6
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7
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8
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- accepted for publication
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- Rangelow, I.W.¹ Hudek, P.² Shi, F.³

9
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- Rangelow, I.W.¹ Hudek, P.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.