Amplification of the index of refraction of aqueous immersion fluids with crown ethers

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 6, Issue 1, 2007, Pages

  López Gejo, Juan ^a   Kunjappu, Joy T ^a   Turro, Nicholas J ^a   Conley, Will ^b  

^a Columbia University Department of Chemistry ^*  (United States)

^b FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

193 nm immersion microlithography; Crown ethers; Refractive index; Second generation immersion fluids

Indexed keywords

AMPLIFICATION; HEAVY METALS; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; SOLUBILITY; VISCOSITY;

IMMERSION FLUIDS; IMMERSION MICROLITHOGRAPHY; SECOND-GENERATION IMMERSION FLUIDS;

CROWN ETHERS;

EID: 34547171210     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2435730     Document Type: Article

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