Nano-fabrication utilizing point defects induced by ion-implantation

Surface and Coatings Technology

Volumn 201, Issue 19-20 SPEC. ISS., 2007, Pages 8521-8525

  Nitta, Noriko ^a   Taniwaki, Masafumi ^a  

^a KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

FIB; GaSb; Nano fabrication; Void

Indexed keywords

CELLULAR STRUCTURE; RASTER SCANNING MODE;

FOCUSED ION BEAMS; IRRADIATION; NANOTECHNOLOGY; POINT DEFECTS; SCANNING;

ION IMPLANTATION;

FOCUSED ION BEAMS; ION IMPLANTATION; IRRADIATION; NANOTECHNOLOGY; POINT DEFECTS; SCANNING;

EID: 34447523754     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.09.315     Document Type: Article

References (7)

1. Nitta N., and Taniwaki. Nucl. Instrum. Methods Phys. Res., B Beam Interact. Mater. Atoms 206 (2003) 482
2. Notzel R., Temmyo J., Furuta T., and Takamura T. Appl. Phys. Lett. 65 (1994) 457
3. Nitta N., Taniwaki M., Suzuki T., Hayashi Y., Satoh Y., and Yoshiie T. J. Jpn. Inst. Met. 64 (2000) 1141
4. Nitta N., Taniwaki M., Suzuki T., Hayashi Y., Satoh Y., and Yoshiie T. Mater. Trans. 43 (2002) 674
5. Nitta N., Taniwaki M., Hayashi Y., and Yoshiie T. J. Appl. Phys. 92 (2002) 1799
6. Biersack J.P., and Haggmark L.G. Nucl. Instrum. Methods 174 (1980) 257
7. Kaito T. J. Mater. Sci. Soc. Jpn. 38 (2001) 184