Growth of electrolytic copper dendrites. I: Current transients and optical observation

Journal of Electroanalytical Chemistry

Volumn 606, Issue 2, 2007, Pages 75-84

  Devos, O ^a   Gabrielli, C ^a   Beitone, L ^b   Mace, C ^b   Ostermann, E ^a   Perrot, H ^a  

^a Université Pierre et Marie Curie   (France)

^b Altis Semiconductor   (France)

Author keywords

Copper; Dendrite; Deposition; Optical technique; Oxalic acid

Indexed keywords

COPPER; DEPOSITION; ELECTROCHEMICAL ELECTRODES; GROWTH RATE;

COPPER DISC ELECTRODES; CURRENT TRANSIENTS; FILAMENTARY GROWTH; OXALIC ACID;

DENDRITES (METALLOGRAPHY);

EID: 34447509482     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2007.03.028     Document Type: Article

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