On the behaviour of copper in oxalic acid solutions

Electrochimica Acta

Volumn 52, Issue 19, 2007, Pages 6012-6022

  Gabrielli, C ^a   Beitone, L ^b   Mace, C ^b   Ostermann, E ^a,b   Perrot, H ^a  

^a Université Pierre et Marie Curie   (France)

^b Altis Semiconductor   (France)

Author keywords

Copper; Deposition; Dissolution; Oxalic acid

Indexed keywords

CARBOXYLIC ACIDS; COMPLEXATION; CYCLIC VOLTAMMETRY; DEPOSITION; DISSOLUTION; PH EFFECTS; SOLUTIONS;

COPPER DEPOSITION; OXALIC ACID;

COPPER;

EID: 34247556000     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2007.03.051     Document Type: Article

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