Germanium nanoparticle formation in thin oxide films on Si by negative-ion implantation

Surface and Coatings Technology

Volumn 201, Issue 19-20 SPEC. ISS., 2007, Pages 8516-8520

  Tsuji, Hiroshi ^a   Arai, Nobutoshi ^a,b   Gotoh, Naoyuki ^a   Minotani, Takashi ^a   Ishibashi, Toyotsugu ^a   Okumine, Tetsuya ^b   Adachi, Kouichiro ^b   Kotaki, Hiroshi ^b   Gotoh, Yasuhito ^a   Ishikawa, Junzo ^a  

^a KYOTO UNIVERSITY   (Japan)

^b SHARP CORPORATION   (Japan)

Author keywords

Germanium; Ion implantation; Nanoparticle; Negative ion

Indexed keywords

ABSORPTION PEAK; NEGATIVE-ION IMPLANTATION;

ABSORPTION SPECTRA; GERMANIUM; LIGHT TRANSMISSION; NANOPARTICLES; NEGATIVE IONS; SILICA;

ION IMPLANTATION;

ABSORPTION SPECTRA; GERMANIUM; ION IMPLANTATION; LIGHT TRANSMISSION; NANOPARTICLES; NEGATIVE IONS; SILICA;

EID: 34447498811     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.02.063     Document Type: Article

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