Growth of electrolytic copper dendrites. III: Influence of the presence of copper sulphate

Journal of Electroanalytical Chemistry

Volumn 606, Issue 2, 2007, Pages 95-102

  Devos, O ^a   Gabrielli, C ^a   Beitone, L ^b   Mace, C ^b   Ostermann, E ^a   Perrot, H ^a  

^a Université Pierre et Marie Curie   (France)

^b Altis Semiconductor   (France)

Author keywords

Copper; Dendrites; Deposition; Optical techniques; Oxalic acid

Indexed keywords

COPPER COMPOUNDS; ELECTRIC FIELDS; GROWTH RATE; LAMINAR FLOW; MICROELECTRODES; ORGANIC ACIDS;

ACTIVATION CURRENT; MORPHOLOGY TRANSITION; OXALIC ACID; TANTALUM CATHODE;

DENDRITES (METALLOGRAPHY);

EID: 34447498648     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2007.05.002     Document Type: Article

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