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Volumn 4, Issue 1, 1996, Pages 7-16

From a compact to a rugged border in ramified copper electrodeposits

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0347397263     PISSN: 0218348X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0218348X96000030     Document Type: Article
Times cited : (9)

References (19)
  • 8
    • 3142557531 scopus 로고
    • Growth Pattern Formation in Copper Electrodeposition: Experimental and Computational Modelling
    • in press
    • G. Marshall, S. Tagtachian and L. Lam, Growth Pattern Formation in Copper Electrodeposition: Experimental and Computational Modelling, Chaos, Solitons and Fractals (in press, 1995).
    • (1995) Chaos, Solitons and Fractals
    • Marshall, G.1    Tagtachian, S.2    Lam, L.3
  • 12
    • 0005827377 scopus 로고
    • A Macroscopic Model for Growth Pattern Formation of Ramified Copper Electrodeposits
    • in press
    • G. Marshall, E. Perone, P. Tarela and P. Mocskos, A Macroscopic Model for Growth Pattern Formation of Ramified Copper Electrodeposits, Chaos, Solitons and Fractals (in press, 1995).
    • (1995) Chaos, Solitons and Fractals
    • Marshall, G.1    Perone, E.2    Tarela, P.3    Mocskos, P.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.