Control of channeling uniformity for advanced applications

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 2000, Pages 670-673

  Olson, J C ^a   Renau, A ^a  

^a VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED APPLICATIONS; ANGLE CONTROL; DEPTH PROFILE; DEVICE PERFORMANCE; DEVICE TECHNOLOGIES; INCIDENCE ANGLES; MANUFACTURING PROCESS; TECHNIQUES USED;

ION IMPLANTATION;

EID: 34447274509     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2000.924242     Document Type: Conference Paper

References (7)

1. Robert Simonton and Al F. Tasch, "Channeling Effects in Ion Implantation into Silicon,", Ion Implantation Science and Technology, James Ziegler, editor, Yorktown, NY:Ion Implantation Technology Co. 1996, pp. 293-390.
2. J.C Olson, A Renau, Patent Pending.
3. A. Renau, D. Hacker, "The VllSta 810 300mm Medium Current Implanter," 1998 International Conference on Ion Implantation Technology Proceedings, Kyoto, Japan, J. Matsuo, G. Takaoka, and I. Yamada, eds., Piscataway, NJ:IEEE 1999, pp. 158-161.
4. A. Renau, "The Beam Line Architecture of the VHSta 810 Medium Current Implanter," 1998 International Conference on Ion Implantation Technology Proceedings, Kyoto, Japan, J. Matsuo, G. Takaoka, and I. Yamada, eds., Piscataway, NJ:IEEE 1999, pp. 162-165.
5. D. L. Smatlak, J. Scheuer, A. Renau, A. Cucchetti, J. Olson, "Beam Purity Control in the VHSta 810 Implanter," 1998 International Conference on Ion Implantation Technology Proceedings, Kyoto, Japan, J. Matsuo, G. Takaoka, and I. Yamada, eds., Piscataway, NJ:IEEE 1999,pp. 166-168.
6. J.C. Olson, A. Renau, J. Buff, "Scanned Beam Uniformity Control in the VHSta 810 Ion Implanter," 1998 International Conference on Ion Implantation Technology Proceedings, Kyoto, Japan, J. Matsuo, G. Takaoka, and I. Yamada, eds., Piscataway, NJ:IEEE 1999, pp. 169-172. (Pubitemid 30520183)
7. J. T. Scheuer, A. Renau, D. L. Smatlak, J. C. Olson, A. Cucchetti, "Defect Density Reduction on the VilSta 810 Implanter," 1998 International Conference on Ion Implantation Technology Proceedings, Kyoto, Japan, J. Matsuo, G. Takaoka, and J. Yamada, eds., Piscataway, NJ:IEEE 1999, pp. 173-175.